1,4-Butanediphosphonic acid - CAS 4671-77-6

1,4-Butanediphosphonic acid (CAS# 4671-77-6 ) is a useful research chemical.

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Molecular Formula
C4H12O6P2
Molecular Weight
218.08

1,4-Butanediphosphonic acid

    • Specification
      • Purity
        98 %
        Storage
        Please store the product under the recommended conditions in the Certificate of Analysis.
        Shipping
        Room temperature in continental US; may vary elsewhere.
        IUPAC Name
        4-phosphonobutylphosphonic acid
        Synonyms
        1,4-BUTANEDIPHOSPHONIC ACID; 1,4-BUTANEBISPHOSPHONIC ACID; 1,4-BUTYLENEBISPHOSPHONIC ACID; 1,4-Butylenebisphosphonic acid, 98 %; 1,4-Butanediphosphonic acid,98%
    • Properties
      • InChI Key
        JKTORXLUQLQJCM-UHFFFAOYSA-N
        InChI
        InChI=1S/C4H12O6P2/c5-11(6,7)3-1-2-4-12(8,9)10/h1-4H2,(H2,5,6,7)(H2,8,9,10)
        Canonical SMILES
        C(CCP(=O)(O)O)CP(=O)(O)O
    • Reference Reading
      • 1. A Simple Nanoscale Interface Directs Alignment of a Confluent Cell Layer on Oxide and Polymer Surfaces
        Patrick E Donnelly, Casey M Jones, Stephen B Bandini, Shivani Singh, Jeffrey Schwartz, Jean E Schwarzbauer J Mater Chem B. 2013 Aug 7;1(29):3553-3561.doi: 10.1039/C3TB20565G.
        Templating of cell spreading and proliferation is described that yields confluent layers of cells aligned across an entire two-dimensional surface. The template is a reactive, two-component interface that is synthesized in three steps in nanometer thick, micron-scaled patterns on silicon and on several biomaterial polymers. In this method, a volatile zirconium alkoxide complex is first deposited at reduced pressure onto a surface pattern that is prepared by photolithography; the substrate is then heated to thermolyze the organic ligands to form surface-bound zirconium oxide patterns. The thickness of this oxide layer ranges from 10 to 70 nanometers, which is controlled by alkoxide complex deposition time. The oxide layer is treated with 1,4-butanediphosphonic acid to give a monolayer pattern whose composition and spatial conformity to the photolithographic mask are determined spectroscopically. NIH 3T3 fibroblasts and human bone marrow-derived mesenchymal stem cells attach and spread in alignment with the pattern without constraint by physical means or by arrays of cytophilic and cytophobic molecules. Cell alignment with the pattern is maintained as cells grow to form a confluent monolayer across the entire substrate surface.
        2. Perforation Does Not Compromise Patterned Two-Dimensional Substrates for Cell Attachment and Aligned Spreading
        Stephen B Bandini, Joshua A Spechler, Patrick E Donnelly, Kelly Lim, Craig B Arnold, Jean E Schwarzbauer, Jeffrey Schwartz ACS Biomater Sci Eng. 2017 Dec 11;3(12):3123-3127.doi: 10.1021/acsbiomaterials.7b00339.Epub 2017 Oct 4.
        Polymeric sheets were perforated by laser ablation and were uncompromised by a debris field when first treated with a thin layer of photoresist. Polymer sheets perforated with holes comprising 5, 10, and 20% of the nominal surface area were then patterned in stripes by photolithography, which was followed by synthesis in exposed regions of a cell-attractive zirconium oxide-1,4-butanediphosphonic acid interface. Microscopic and scanning electron microscopy analyses following removal of unexposed photoresist show well-aligned stripes for all levels of these perforations. NIH 3T3 fibroblasts plated on each of these perforated surfaces attached to the interface and spread in alignment with pattern fidelity in every case that is as high as that measured on a nonperforated, patterned substrate.
Bio Calculators
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